Abstract
Creating a regular surface pattern on the nanometre scale is important for many technological applications, such as the periodic arrays constructed by optical microlithography that are used as separation media in electrophoresis1, and island structures used for high-density magnetic recording devices2. Block copolymer patterns can also be used for lithography on length scales below 30 nanometres (refs 3,4,5). But for such polymers to prove useful for thin-film technologies, chemically patterned surfaces need to be made substantially defect-free over large areas, and with tailored domain orientation and periodicity. So far, control over domain orientation has been achieved by several routes6,7,8,9, using electric fields, temperature gradients, patterned substrates and neutral confining surfaces. Here we describe an extremely fast process that leads the formation of two-dimensional periodic thin films having large area and uniform thickness, and which possess vertically aligned cylindrical domains each containing precisely one crystalline lamella. The process involves rapid solidification of a semicrystalline block copolymer from a crystallizable solvent between glass substrates using directional solidification and epitaxy. The film is both chemically and structurally periodic, thereby providing new opportunities for more selective and versatile nanopatterned surfaces.
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References
Volkmuth, W. D. & Austin, R. H. DNA electrophoresis in microlithographic arrays. Nature 358, 600–602 (1992).
Chou, S. Y., Wei, M. S., Krauss, P. R. & Fischer, P. B. Single-domain magnetic pillar array of 35-nm diameter and 65-Gbits/in2 density for ultra high density quantum magnetic storage. J. Appl. Phys. 76, 6673–6675 (1994).
Mansky, P., Chaikin, P. M. & Thomas, E. L. Monolayer films of diblock copolymer microdomains for nanolithographic applications. J. Mater. Sci. 30, 1987–1992 (1995)
Park, M., Harrison, C. K., Chaikin, P. M., Register, R. A. & Adamson, D. H. Block copolymer lithography: periodic arrays of ∼1011 holes in 1 square centimeter. Science 276, 1401–1404 (1997).
Lammertink, R. G. et al. Nanostructured thin films of organic-organometallic block copolymers: one-step lithography with poly(ferrocenylsilanes) by reactive ion etching. Adv. Mater. 12, 98–103 (2000).
Morkved, T. L. et al. Local control of microdomain orientation in diblock copolymer thin films with electric fields. Science 273, 931–933 (1996).
Mansky, P. et al. Large-area domain alignment in block copolymer thin films using electric fields. Macromolecules 31, 4399–4401 (1998).
Fasolka, M. et al. Observed substrate topography-mediated lateral patterning of diblock copolymer films. Phys. Rev. Lett. 79, 3018–3021 (1997).
Huang, E., Rockford, L., Russell, T. P. & Hawker, C. J. Nanodomain control in copolymer thin films. Nature 395, 757–758 (1998).
Muthukumar, M., Ober, C. K. & Thomas, E. L. Competing interactions and levels of ordering in self-organizing polymeric materials. Science 277, 1225–1232 (1997).
Hashimoto, T., Shibayma, M., Fujimura, M. & Kawai, H. in Block Copolymers, Science and Technology (ed. Meier, D. J.) 63-108 (Harwood Academic, London, 1983).
Bodycomb, J., Funaki, Y., Kimishima, K. & Hashimoto, T. Single grain lamellar microdomain from a diblock copolymer. Macromolecules 32, 2075–2077 (1999).
Flemings, M. C. Solidification Processing (McGraw Hill, New York, 1974).
Swei, G. S., Lando, J. B., Reichert, S. E. & Mauritz, K. A. Encyclopedia of Polymer Science and Engineering Vol. 6, p. 209 (Wiley, New York, 1986).
Wittmann, J. C. & Lotz, B. Epitaxial crystallization of polymers on organic and polymeric substrates. Prog. Polym. Sci. 15, 909–948 (1990).
Reiter, G. et al. Nanometer scale surface patterns with long range order created by crystallization of diblock copolymers. Phys. Rev. Lett. 83, 3844–3847 (1999).
Smith, P. & Pennings, A. J. Eutectic crystallization of pseudo binary systems of polyethylene and high melting diluents. Polymer 15, 413–419 (1974).
Wittmann, J. C., Hodge, A. M. & Lotz, B. Epitaxial crystallization of polymers onto benzoic-acid-polyethylene and paraffins, aliphatic polyesters, and polyamides. J. Polym. Sci. Polym. Phys. Edn 21, 2495–2509 (1983).
Dorset, D. L., Hanlon, J. & Karet, G. Epitaxy and structure of paraffin-diluent eutectics. Macromolecules 22, 2169–2176 (1989)
Wu, S. Polymer Interface and Adhesion (Marcel Dekker, New York, 1982).
Thomas, E. L. & Ast, D. Image intensification and the electron microscopy of radiation sensitive polymers. Polymer 15, 37–41 (1974).
Kim, G. & Libera, M. Kinetic constraints on the development of surface microstructures in SBS thin films. Macromolecules 31, 2670–2672 (1998).
Acknowledgements
We thank J.C. Wittmann, Y. Cohen, C. Thompson, C. Carter and L. Fetters for conversations; L. Fetters also synthesized the copolymer. This work was supported by the NSF, ACS-PRF and US-France NSF-CNRS.
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De Rosa, C., Park, C., Thomas, E. et al. Microdomain patterns from directional eutectic solidification and epitaxy. Nature 405, 433–437 (2000). https://doi.org/10.1038/35013018
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DOI: https://doi.org/10.1038/35013018
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