Abstract
THE density of thin metal films deposited from vapour has been determined by several investigators1–6. There is contradictory evidence on film densities in that some studies have shown film densities to be lower than that of bulk metal1,2 whereas others have shown no such difference3–6. We have determined the density of vapour-deposited copper films in the thickness range 960–4000 Å using X-ray absorption measurements. Up to now this method has not been reported in the literature.
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WEINSTEIN, A., D'ANTONIO, C. & MUKHERJEE, K. Density of Copper Thin Films measured by X-ray Absorption. Nature 220, 777–778 (1968). https://doi.org/10.1038/220777a0
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DOI: https://doi.org/10.1038/220777a0
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