Abstract
IN continuation of work carried out in this Laboratory on the electric and magnetic properties of thin metallic films1, we have now investigated the resistivity of nickel films (20 mμ–700 mμ) between – 236°C. and 400°C. The films are deposited on thin glass sheets by using cathodic sputtering in an atmosphere of hydrogen gas, carefully purified. We measured the electric resistance as a function of thickness and temperature below and above the Curie point. Between 0° C. and – 183° C., we found approximately a linear variation of the resistance with temperature. Below – 183° C. and also between 0° C. and the Curie point this is not the case. Above 358° C. the temperature coefficient of the resistance is again constant.
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References
Physica, 11, 78 (1944).
Ann. Phys., 19, 272 (1944).
Ann. Phys., 19, 272 (1944).
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VAN ITTERBEEK, A., DE GREVE, L. Resistivity of Thin Metallic Films. Nature 156, 634–635 (1945). https://doi.org/10.1038/156634a0
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DOI: https://doi.org/10.1038/156634a0
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